M04000 - SEMI M40 - シリコンウェーハ表面のラフネス測定のガイド Revision:SEMI M40-1109 - Superseded Refer to ¶ 3
$115.50
Description
Refer to ¶ 3
SEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers
that can detect higher atomic number Z
Aspects of the 200 mm (8 in
M04000 - SEMI M40 - シリコンウェーハ表面のラフネス測定のガイド Revision:SEMI M40-1109 - Superseded Refer to ¶ 3global Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM20002 SEMI M1 3 Referenced SEMI Standards SEMI E89 Guide for Measurement System Analysis (MSA) SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M50 Test Method for Determining Capture Rate and False Count Rate
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