MF139100 - SEMI MF1391 - Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption Revision:SEMI MF1391-1107 (Reapproved 1023) - Current This Standard covers the domain

This Standard covers the domain of semiconductor manufacturing equipment operation

SEMI F81-0624 (technical revision)

SEMI MF1366-0308 (technical revision)

FPD用ガラス基板の有効範囲外に刻印されるマーキングシンボルの位置・寸法・情報量を規定する。

MF139100 - SEMI MF1391 - Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption Revision:SEMI MF1391-1107 (Reapproved 1023) - Current This Standard covers the domainThis reference Test Method covers the determination of substitutional carbon concentration in single crystal silicon. Because carbon may also reside in interstitial lattice positions when in concentrations near the solid solubility limit, the results of this Test Method may not be a measure of the total carbon concentration at such concentrations. The useful range of carbon concentration measurable by this Test Method is from the maximum amount of