D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdPbc-1217 This Practice may also be

This Practice may also be applied to detection of defects in epitaxial layers

This Specification provides information for developing specifications for silicon annealed wafers used to fabricate semiconductor devices and integrated circuits

This method outlines standard mechanical measurement techniques for cut strip leadframes

1  This Specification describes a method for data acquisition EDA Applications to request process and data from equipment to be communicated in an automated fashion by the equipment

D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdPbc-1217 This Practice may also beThis Standard defines the terminology for FPD phase shift masks and mask blanks. This Standard applies to phase shift masks and mask blanks that are principally used in fabricating flat panel displays. Referenced SEMI Standards (purchase separately) None. Revision History SEMI D84 0823 (first published)